Applied Nanotools (Canada)

Compact, lightweight, and high performance flat optical components with high-resolution subwavelength features in the visible and near-infrared spectra are manufactured using high throughput electron beam lithography. Our process enables researchers and industrial professionals to rapidly prototype integrated photonic circuits. Devices are manufactured using a state-of-the-art 100 keV electron beam lithography system.

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Compact, lightweight, and high performance flat optical components with high-resolution subwavelength features in the visible and near-infrared spectra are manufactured using high throughput electron beam lithography. Our process enables researchers and industrial professionals to rapidly prototype integrated photonic circuits. Devices are manufactured using a state-of-the-art 100 keV electron beam lithography system.

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